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Why You'll Love It
Product Type: Foundation
What It Does: Full, flawless coverage in one swipe? That’s all it takes for this lightweight foundation balm to mute blemishes, tattoos, dark circles—you name it. It’s infused with apple extract and sodium hyaluronate to nourish and hydrate dry skin (but oily skin types can enjoy it too with a little powder).
How to Use It: Don’t go overboard—a little goes a long way. Use a damp sponge if you’re not looking for full coverage but still want to blur imperfections. Use a foundation brush if you’re looking for maxed-out coverage. Use your fingers to sheer it out. Experiment with which method works best for you—this balm really is versatile and works with everyone’s skin differently.
More Reasons You’ll Love It: The packaging is recyclable, the formula is vegan, and it’s totally cruelty-free.
About the Brand: KVD BEAUTY celebrates the individual while rejecting conventional beauty standards and conformity. They accept the beauty of our uniqueness and flaws, which is why their vegan and cruelty-free formulations are made for everyone in mind.
Triethylhexanoin, Octyldodecanol, Silica, Dimethicone, Dibutyl Lauroyl Glutamide, Octyldodecyl Neopentanoate, Disteardimonium Hectorite, Isostearyl Alcohol, Oleyl Alcohol, Polymethyl Methacrylate, Pyrus Malus (Apple) Fruit Extract, Disodium Stearoyl Glutamate, Mica, Hydrolyzed Sodium Hyaluronate, Polysilicone-11, Aqua/Water/Eau, Butylene Glycol, Caprylyl Glycol, Phenoxyethanol, Aluminum Hydroxide, Carthamus Tinctorius (Safflower) Seed Oil, Hexylene Glycol, Tocopheryl Acetate, Tocopherol, Ascorbic Acid, Decyl Glucoside, Glycerin, Sodium PCA, Sodium Lactate, Arginine, Aspartic Acid, PCA, Saccharomyces/Magnesium Ferment, Glycine, Alanine, Serine, Valine, Saccharomyces/Copper Ferment, Potassium Sorbate, Saccharomyces/Silicon Ferment, Isoleucine, Proline, Threonine, Saccharomyces/Zinc Ferment, Hyaluronic Acid, Saccharomyces/Iron Ferment, Silanetriol, Citric Acid, Sorbic Acid, Histidine, Phenylalanine. May contain/Peut contenir (+/-): Titanium Dioxide (CI 77891), Iron Oxides (CI 77491, CI 77492, CI 77499).